What does "doping" refer to in semiconductor manufacturing?

Doping in semiconductor manufacturing specifically refers to the addition of impurities to a pure semiconductor material, such as silicon, to modify its electrical properties. This process is critical for creating p-type or n-type semiconductors, which are essential for the operation of diodes, transistors, and various electronic components. By introducing specific impurities, such as boron for p-type semiconductors or phosphorus for n-type, the electrical characteristics are significantly enhanced, allowing for improved conductivity and control of electrical behavior.

This is a fundamental aspect of semiconductor physics that enables the development of electronic devices. The other concepts in the options, such as shaping, cooling, or joining materials, do not specifically relate to the intentional modification of the semiconductor's intrinsic properties through impurity introduction, which is the essence of doping.